Model of formation and propagation of nanoporous structures in indium phosphide during anodisation in aqueous KOH

Keyes, Michael G.M. and Quill, Nathan and Bourke, Andrea and O'Dwyer, Colm and Nolan, Clifford and Clancy, Ian and Buckley, D. Noel and Lynch, Robert P. (2018) Model of formation and propagation of nanoporous structures in indium phosphide during anodisation in aqueous KOH. In: ECS Transactions :. ECS Transactions (13). IOP Publishing Ltd., USA, pp. 1335-1348. ISBN 9781510866171

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Abstract

Porous layers are formed in highly doped (1018 cm-3) n-type InP anodised in concentrated aqueous KOH solutions. The pores have a characteristic diameter and propagate along <111>A directions. This preferential etching leads to porous regions with a characteristic tetrahedral shape. We have previously proposed a three-step mechanism of electrochemical pore formation: (1) hole generation at pore tips, (2) hole diffusion and (3) electrochemical oxidation of the semiconductor to form etch products. Step 1 determines the overall etch rate. However, if the kinetics of Step 3 are slow relative to Step 2, then etching can occur at preferred crystallographic sites leading to pore propagation in preferential directions. We have implemented the fundamental rules of this mechanism in a numerical simulation of this mechanism and we show that the simulation reproduces many of the features of pore growth in InP.

Item Type:	Book Section
Additional Information:	Funding Information: R. P. Lynch and N. Quill would like to thank the Irish Research Council (IRC) for PhD scholarships to perform this research. R. P. Lynch acknowledges a joint IRC - Marie Curie Fellowship under grant no. INSPIRE PCOFUND-GA-2008-229520. The authors would also like to acknowledge the support of the Tyndall National Institute. This support was provided through the SFI-funded National Access Programme (Project NAP No. 37 and 70). The authors acknowledge AFM measurements by M. Serantoni. Publisher Copyright: © The Electrochemical Society.
Uncontrolled Keywords:	/dk/atira/pure/subjectarea/asjc/2200
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Depositing User:	Admin SSL
Date Deposited:	19 Oct 2022 23:15
Last Modified:	07 Jun 2023 18:38
URI:	http://repository-testing.wit.ie/id/eprint/4861

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